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Younghun Bae 1 Article
340 Optimization of Ion Beam-Assisted Deposition Process for Y2O3 Film to Enhance Plasma Resistance
내 플라즈마 특성 강화를 위한 Y2O3 필름의 이온 빔 보조 증착 공정 최적화
Choluk Oh, Ojun Kwon, Younghun Bae, Hyejin Shin, Young Min Kwon, Byungjin Cho
오철욱, 권오준, 배영헌, 신혜진, 권영민, 조병진
Korean J. Met. Mater. 2024;62(5):340-350.   Published online 2024 May 5
DOI: https://doi.org/10.3365/KJMM.2024.62.5.340

Abstract
A ceramic-based plasma etcher window (Lid) requires robust resistance to plasma, especially when exposed to harsh fluorine-based plasma conditions. In this study, a Y2O4 film was deposited using e-beam evaporation with ion beam-assisted deposition (IBAD), and the physical properties of the IBAD-based Y2O4 coating film were thoroughly examined to enhance..... More

                
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