Choluk Oh, Ojun Kwon, Younghun Bae, Hyejin Shin, Young Min Kwon, Byungjin Cho오철욱, 권오준, 배영헌, 신혜진, 권영민, 조병진
Korean J. Met. Mater. 2024;62(5):340-350. Published online 2024 May 5
DOI:
https://doi.org/10.3365/KJMM.2024.62.5.340
Abstract
A ceramic-based plasma etcher window (Lid) requires robust resistance to plasma, especially when exposed to harsh fluorine-based plasma conditions. In this study, a Y
2O
4 film was deposited using e-beam evaporation with ion beam-assisted deposition (IBAD), and the physical properties of the IBAD-based Y
2O
4 coating film were thoroughly examined to enhance.....
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